A-oxide A-oxide deposited by DD1, thin (33 nm) film
A-oxide (thick layer) A-oxide deposited by DD1, thick (233 nm) layer
Ag model (DD1) Ag as deposited by sputtering device DD1
Air Filling gas
Ar(50)Kr(50) (100%) Filling gas
Ar(50)Kr(50) (95%) Filling gas
Ar(50)Kr(50) (90%) Filling gas
Ar(50)Kr(50) (85%) Filling gas
Ar(50)Kr(50) (80%) Filling gas
Ar(50)Kr(50) (75%) Filling gas
Ar(50)Kr(50) (70%) Filling gas
Ar(70)SF6(30) (100%) Filling gas
Ar(70)SF6(30) (95%) Filling gas
Ar(70)SF6(30) (90%) Filling gas
Ar(70)SF6(30) (85%) Filling gas
Ar(70)SF6(30) (80%) Filling gas
Ar(70)SF6(30) (75%) Filling gas
Ar(70)SF6(30) (70%) Filling gas
Argon (100%) Filling gas
Argon (95%) Filling gas
Argon (90%) Filling gas
Argon (85%) Filling gas
Argon (80%) Filling gas
Argon (75%) Filling gas
Argon (70%) Filling gas
B-oxide B-oxide deposited by DD1, thick (320 nm) and thin (25 nm) film
Float A Float glass, based on VirCoC R and T measurements
Glass (microscope slide), Vis This item has been copied from the CODE database
Krypton (100%) Filling gas
Krypton (95%) Filling gas
Krypton (90%) Filling gas
Krypton (85%) Filling gas
Krypton (80%) Filling gas
Krypton (75%) Filling gas
Krypton (70%) Filling gas
SF6 (100%) Filling gas
SF6 (95%) Filling gas
SF6 (90%) Filling gas
SF6 (85%) Filling gas
SF6 (80%) Filling gas
SF6 (75%) Filling gas
SF6 (70%) Filling gas
Universal oxide This item has been copied from the CODE database
Xenon (100%) Filling gas
Xenon (95%) Filling gas
Xenon (90%) Filling gas
Xenon (85%) Filling gas
Xenon (80%) Filling gas
Xenon (75%) Filling gas
Xenon (70%) Filling gas